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1

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Optical/Laser Microlithography II - Optimization and Characterization of Single Layer Resist Techniques for 1 μm CMOS Production

Karnett, Martin P., Sarnoff, Mary C., Lin, Burn J.

Year:

1989

Language:

english

File:

PDF, 35.59 MB

english, 1989

2

SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Optimization of pre-gate clean technology for a 0.35-μm dual-oxide/dual-voltage CMOS process

Brugge, Hunter B., Karnett, Martin P., de Muizon, Emmanuel, Zhou, Jingrong, Page, Allen, Vines, Landon B., Haby, Bradley J., Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, Dirk

Year:

1997

Language:

english

File:

PDF, 270 KB

english, 1997

3

Crossed-beam studies of the reaction of O− with allene

Martin P. Karnett, R.J. Cross

Journal:

Chemical Physics Letters

Year:

1981

Language:

english

File:

PDF, 226 KB

english, 1981

4

Crossed-beam studies of negative ion-molecule reactions: O− + D2O → OD− + OD

Martin P. Karnett, R.J. Cross

Journal:

Chemical Physics Letters

Year:

1981

Language:

english

File:

PDF, 419 KB

english, 1981

5

SPIE Proceedings [SPIE Microelectronic Manufacturing 1996 - Austin, TX (Wednesday 16 October 1996)] Microelectronic Manufacturing Yield, Reliability, and Failure Analysis II - Plasma-induced oxide contamination in a 0.35-um CMOS process

Karnett, Martin P., Zhou, Jingrong, Ghosh, Sumanta, Echtle, Danny, Fritz, L., Manley, Martin, Scott, Gregory S., Keshavarzi, Ali, Prasad, Sharad, Hartmann, Hans-Dieter

Year:

1996

Language:

english

File:

PDF, 549 KB

english, 1996

6

SPIE Proceedings [SPIE Microelectronic Manufacturing '99 - Santa Clara, CA (Wednesday 22 September 1999)] In-Line Methods and Monitors for Process and Yield Improvement - Influence of metal deposition temperature on deep-submicrometer metal lithography

Subramaniam, Vijaya, Siems, Daniel D., Karnett, Martin P., Maheshwary, Sonu R., Sur, Harlan, Ajuria, Sergio A., Jakubczak, Jerome F.

Year:

1999

Language:

english

File:

PDF, 930 KB

english, 1999

7

SPIE Proceedings [SPIE 1988 Microlithography Conferences - Santa Clara, CA (Wednesday 2 March 1988)] Integrated Circuit Metrology, Inspection, and Process Control II - An Improved SEM Technique For Accurate Determination Of MOSFET Channel Length

Karnett, Martin P., Dunham, Robert E., Monahan, Kevin M.

Year:

1988

Language:

english

File:

PDF, 2.50 MB

english, 1988

8

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Challenges in Process Integration and Device Technology - Yield-limiting NMOSFET gate depletion in a deep submicrometer CMOS process

Karnett, Martin P., Qian, Steven G., Mitchell, Todd, Subramaniam, Vijaya, Sur, Harlan, Haby, Bradley J., Brugge, Hunter B., Burnett, David, Kimura, Shin'ichiro, Singh, Bhanwar

Year:

2000

Language:

english

File:

PDF, 394 KB

english, 2000

9

SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Optical Microlithography VI - Tapered Wet Etching Of Contacts Using A Trilayer Silox Structure

Karnett, Martin P., Stover, Harry L.

Year:

1987

Language:

english

File:

PDF, 6.10 MB

english, 1987